| 摘要 |
PURPOSE:To manufacture a high-performance thin-film magnetic head, by adjusting the exposing time of a 2nd coil conductor layer to a prescribed coil pattern after a photoresist is applied by using an auxiliary mask in addition to an ordinary mask when the 2nd coil conductor layer is formed after an insulating layer is formed on a 1st coil conductor layer. CONSTITUTION:After the 1st coil conductor layer 51 and insulating layer 42 covering the layer 51 are formed on a base plate in prescribed shapes, a positive type photoresist 7 is applied to them. Then, by using an ordinary mask 8 in which holes are formed in corresponding to the coil pattern of the 2nd coil conductor layers 52, the layer 52 is exposed to the coil pattern. Thereafter, the layer 52 is again exposed by using an auxiliary mask 9 provided with holes only at sections corresponding to connecting sections 51a where the photoresist 7 is thicker. If exposure is made in such a way, exposure is carried out sufficiently within the exposing time necessary for each thickness (a) and (b), even when the thickness of the photoresist 7 varies from place to place. After the exposure, the photoresist 7 is developed so as to remove the photoresist 7 at sections corresponding to the coil pattern of the 2nd coil conductor layer 52. Thus a magnetic head is manufactured.
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