| 摘要 |
<p>PURPOSE:To eliminate a coating irregularity by providing a wafer holding member having a recess on which the peripheral face of a semiconductor wafer abuts and a holding lever for pressing the wafer to the recess, and moving means for stopping the member at a position where the center of the wafer is matched to the rotational shaft of a spin coater. CONSTITUTION:A wafer 31 removed from a containing member 32 is transferred to the holder 21 of a transfer device 10 by means of a belt conveyor 34. At the holder 21, after the peripheral face of the wafer 31 abuts on recesses 19A, 20A, holding levers 19B, 20B are rotated in directions C1, C2 to be pressed to the recesses 19A, 20A. Then, the transfer device 10 is moved by driving means 25 connected to a guide shaft 14A along guide shafts 12A, 12B in a direction D1. When the holder 21 arrives at a spin coater 40 and the wafer 31 is disposed directly above a rotary shaft 41, the transfer device 10 is stopped. The center of the wafer 31 is matched to the rotary axis of the shaft 41 at this time. Thus, it can prevent coating irregularity from occurring due to the spin coater and the wafer from being scattered.</p> |
