发明名称 PLASMA X-RAY SOURCE
摘要 PURPOSE:To make it possible to obtain a plasma X-ray source with high brightness, long service life and large freedom in wave length selection by making the inside of a discharge vessel vacuum while providing a switching means outside a discharge circuit and also forming either of electrodes with X-ray generating material. CONSTITUTION:A switching means is sealed inside an electrode 1 positioned at the center of a vessel through an insulating material 11 and formed with a trigger electrode 12 drawn to the outside and a trigger pulse source 13 provided between the trigger electrode 12 and an electrode 1. Then, the inside of a discharge vessel 4 is exhausted in vacuum through an exhaust hole 14 and maintained at high vacuum degree. An X-ray material having a desired wave length is used for faced electrodes 1 and 2. Since discharge is generated on the faced electrodes with a switching means provided outside the discharge circuit, a switching means inside the discharge circuit is eliminated so that a large current with high speed pulse is obtained. Therefore, it is possible to generate X-ray with high brightness, eliminate the deterioration of the insulating material and prolong the service life in the plasma X-ray source.
申请公布号 JPS63284744(A) 申请公布日期 1988.11.22
申请号 JP19870117056 申请日期 1987.05.15
申请人 HITACHI LTD 发明人 SUZUKI KOJI;ARITA HIROSHI;TOKUYAMA SHUNJI;KUROSAWA YUKIO
分类号 H05G2/00;H01J35/22;H01L21/027;H01L21/30;H05G1/02 主分类号 H05G2/00
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