发明名称 DRY-ETCHING EQUIPMENT
摘要 PURPOSE:To maintain an etching rate constant by a method wherein a cooling water piping for cooling an electrode plate is composed of a plurality of pipes and cooling water is run through the respective pipes independently. CONSTITUTION:A plurality of pipes are provided inside at least one electrode 2b among 1st and 2nd electrodes. Cooling water is passed through the respective pipes independently and simultaneously. For instance, as the lengths of the four pipes 10-13 provided at the different positions inside the electrode 2b are not so different from each other, the cooling water flowing through the pipes 10-13 is drained out from the pipe ends 10b-13b at approximately the same temperature. Therefore, the bottom of the electrode 2b is cooled so as to make the difference in temperature zero over the whole bottom surface from the inner circumference part to the outer circumference part. As the temperature of the cooling water is constant, a constant etching rate and a constant selection ratio can be obtained.
申请公布号 JPS63284820(A) 申请公布日期 1988.11.22
申请号 JP19870119827 申请日期 1987.05.15
申请人 FUJITSU LTD 发明人 TAKIZAWA ATSUSHI
分类号 H01L21/302;H01L21/3065 主分类号 H01L21/302
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