| 摘要 |
<p>PURPOSE:To obtain a material for a hydgosensible resistor having high reliability by using a reaction product of a film formable thermoplastic polymer with a polymer having isocyanate groups at its terminals. CONSTITUTION:A hygrosensible resistor is formed from a reaction product of a film formable polymer having sufonic acid groups and/or its salt groups and epoxy groups at the side chains with a polymer having <=0 deg.C glass transition temp. and isocyanate groups at its terminals. The hygrosensible resistor made from such a reaction product is formed as follows. Polystyrene having 3,000 average degree of polymerization is sufonated to introduce sufonic acid groups, and glycidyl methacrylate is introduced by graft polymerization. Hexamethylene diisocyanate is added to the terminals of the denatured polystyrene and polyethylene adipate to obtain a polymer. After the polymer is dissolved in dimethylformamide and mixed, it is casted on a polytetrafluoroethylene plate having a flat surface to obtain the hygrosensible resistor film.</p> |
