发明名称 PRODUCTION OF POROUS BASE MATERIAL FOR QUARTZ GLASS
摘要 PURPOSE:To enhance the yield of a porous base material for quartz glass and to stably obtain the porous base material with regulated shape and large diameter by regulating the conditions of an air current in a reactor by means of a specified method in the case of hydrolyzing silicon halide with oxyhydrogen flame in the reactor, depositing the produced fine silica particles on a starting member, and growing it. CONSTITUTION:A porous base material 5 for quartz glass is formed by hydrolyzing silicon halide in oxyhydrogen flame (a burner 1), depositing and growing the produced fine silica particles on a rotating target (a seeding rod 4 and the porous base material 5 being formed). In this case, the conditions of an air current in a reactor 3 are regulated by flowing inert gas or air (introduced through 8) upward along the outer circumferential surface of the base material 5 from the inner bottom part of the reactor 3. The above-mentioned inert gas or air is preferably flowed through a ring-shaped gas dispersion ejector 2 provided to the inner bottom part of the reactor 3.
申请公布号 JPS63282137(A) 申请公布日期 1988.11.18
申请号 JP19870113631 申请日期 1987.05.12
申请人 ASAHI GLASS CO LTD 发明人 KOBAYASHI SHIGEYOSHI;IKEMURA MASAAKI;OTA YUKINORI;NAKAJIMA HIROAKI
分类号 G02B6/00;C03B8/04;C03B20/00;C03B37/014;C03B37/018 主分类号 G02B6/00
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