| 摘要 |
PURPOSE:To execute with high accuracy an optical axis alignment of an optical fiber for constituting an optical element, and an optical fiber for input and output by forming a thin layer consisting of a material for constituting a guide on the whole surface of a substrate, and working the thin layer into a desired pattern. CONSTITUTION:First of all, on the whole surface of a quartz substrate 20, a thin film 21 consisting of quartz is formed. Subsequently, on the whole surface of the thin film 21, a photoresist 22 is formed. Thereafter, on the resist 22, a photomask 23 having an opening in only a part corresponding to a pattern forming area of the thin film 21 is formed and photoirradiation is executed, and the resist 22 being right under the opening of the mask 23 is hardened. After having removed the mask 23, the resist 22 is developed and the resist pattern 22 is formed. In the end, by using the pattern 22 as a mask, etching of the thin film 21 is executed, and the guide 21 is formed. Thereafter, in the guide 21 of the substrate 20, an optical fiber 24 is provided, and an axial alignment and a connection of each optical fiber are executed. In such a way, the optical axis alignment with the optical fiber for input and output can be executed with high accuracy.
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