发明名称 |
MICRO-ENVIRONMENTAL SENSOR AND MANUFACTURE AND USAGE THEREOF |
摘要 |
A method of making a microenvironmental sensor for neurological use in which the sensor is formed on a silicon wafer (7) by the use of known integrated circuit techniques. A mask is applied to define the outline of the sensor, trenches are etched surrounding the sensor by the use of an anisotropic etchant and the sensor is separated by etching surplus silicon from the rear surface of the wafer. |
申请公布号 |
JPS63282645(A) |
申请公布日期 |
1988.11.18 |
申请号 |
JP19880017545 |
申请日期 |
1988.01.29 |
申请人 |
UNIV KARETSUJI KAADEIFU CONSULTANTS LTD |
发明人 |
PIITAA UOORU;ROBAATO ESU PIKAADO |
分类号 |
G01N27/12;A61B5/04;A61B5/042;G01N27/00;G01N27/02;H01L21/306 |
主分类号 |
G01N27/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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