X-ray mask made from silicon combined with silicon nitride layers, and process for the production thereof

摘要

In an X-ray mask made from silicon combined with silicon nitride layers, a silicon membrane (3) has been removed completely in the area of the adjustment (alignment) marks, where a thin silicon nitride layer (1) takes on the support function and simultaneously serves as adhesion layer for the starting layer (7) necessary in the case of absorber structuring by electrodeposition or directly for the absorber in the case of subtractive structuring.