Method for providing a design pattern on a metal stencil and metal stencil having a patternable covering layer.

摘要

The invention relates to a method for forming a pattern in a metal stencil or screen which is covered by a covering layer in the form of a resist material. The pattern is formed by locally removing the lacquer or resist from the screen's perforations with use of a beam of high energy radiation such as a laser beam. The resist material used is filled to a high concentration with metal powder to increase the thermal conductivity thereof. The invention also relates to a metal stencil provided with such a metal-filled covering layer which layer is patternable with use of a radiation beam.