| 摘要 |
PURPOSE:To obtain a high temperature critical value by spattering or evaporating a ceramic material which has a specified composition and is of a perovskite structure or a structure similar to the K2NiF4 type, and then performing a prescribed heat-treatment. CONSTITUTION:By using a ceramic material, which has a composition of AxByOz, and has a perovskite structure or a structure similar to the K2NiF4 type, where A are transition elements of not less than two kinds which are chosen from among Ba, Sr, Ra, Sc, Y, La and other rare earth elements, B are elements of transition metal, such as Cu and the like, and then, x=1-2, y=1 and z=3-4, a thin film is formed on a substrate by means of a spattering method or a depositing method. Said spattering or deposition is performed in a gas atmosphere including at least not less than 10% of oxygen while the temperature of the substrate is kept at about 500-900 deg.C. The film is heat- treated for 2-24 hours at about 600-1,000 deg.C in said oxygen gas atmosphere.
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