发明名称 COMPOUND THIN FILM FORMATION DEVICE
摘要 PURPOSE:To deposit and efficiently stable and superior compound thin film on the surface of a substrate by mounting an electric field shield plate and a specific accelarative electrode in an internal container installed in a vacuum vessel. CONSTITUTION:An electrode 31 for extracting electron beams and an electric field shield plate 32 so as to shield and electron beam emission means 30 in terms of electric potential are mounted between the electric field shield plate 32 and a substrate 16 in an internal container 28 installed in a vacuum vessel 1. And further, an accelarative electrode 33 which permits the electrode 31 for extracting the electron beams and the electron beam emission means 30 to be biased to a positive potential is also mounted in like manner in the above vacuum vessel. As film properties such as crystalline property and forces of adhesion and so on of deposited thin films which are formed on the substrate can be controlled, the efficiently stable and superior deposited thin films are formed at high depositing speed.
申请公布号 JPS63278218(A) 申请公布日期 1988.11.15
申请号 JP19870056686 申请日期 1987.03.13
申请人 MITSUBISHI ELECTRIC CORP 发明人 ITO HIROMOTO
分类号 H01L21/203;C23C14/32;H01L21/26 主分类号 H01L21/203
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