Method for making lithographic printing plate using light wavelengths over 700 mu m

摘要

Lithographic printing plates which have such a high sensitivity as permitting use of semiconductor laser beam of low output, a high resolving power and a high printing endurance and are free from occurrence of scumming are made by a method which comprises imagewise exposing a light sensitive material which comprises a support and at least a silver halide emulsion layer and a surface physical development nuclei layer provided on the support, said emulsion layer comprising silver halide grains which contain at least silver bromide and containing at least one sensitizing dye having a maximum spectral sensitivity in the region of longer than 700 mu m and then developing the exposed light sensitive material with a silver complex diffusion transfer developer containing at least a thiocyanate. Further improvement can be obtained by providing an antihalation means to keep the reflectance of a light of longer than 700 mu m at 13-40%.