| 摘要 |
PURPOSE:To obtain a silicon steel plate having excellent thermostable and unidirectional properties without bring about the deterioration in the performance because of a high temperature treatment by forming a mixture phase among Fe atoms, accelarating ions, and evaporation inos between tension films on the polishing treatment surface of the silicon steel phate as a substrate. CONSTITUTION:A mixture phase with base steels is mainly formed with at least on kind of nitrides and/or carbides chosen out of the above nitrides and/or carbides of Ti, Zr, Hf, V, Nb, Ta, Mn, Cr, Mo, W, Co, Ni, Al, B, and Si at the surface of a unidirectional silicon steel plate where its finishing annealing is performed and non-metallic substances are removed or further at its flat surface finished by polishing and through the mixture phase with these base steels, tension films having a layer of 0.005-5 mum, at least are firmly deposited on the surface of the above steel plate and further, another tension film is deposited by putting it together with an insulation coating baking layer on the initial tension film. The film thickness of the tension films is adaptable within a range 0.005-5 mum. When it is less than 0.005 mum, it does not contribute toword necessary tension and on the other hand, when it exceeds 5 mum, space factor and adhesion decrease.
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