| 摘要 |
PURPOSE:To prevent cloudiness of a light incident window part and to stably advance chemical reaction on the surface of a substrate by providing a means for heating the light incident window part of a reaction chamber. CONSTITUTION:In a device for utilizing photochemical reaction wherein a silicon oxide film or the like is formed on a silicon substrate 1, electrically-conductive substance 14 is coated in a band-shape on quartz glass constituting the light incident window part 12 of a reaction chamber 2. The light incident window part 12 is heated by allowing current to flow through the electrically-conductive substance 14. Further a heater may be provided around the light incident window part 12. The deposition velocity onto the light incident window part 12 of a reaction product in the reaction chamber 2 is lowered by the rise in temp. of the light incident window part 12 and the cloudiness of the light incident window part 12 is inhibited. |
