| 摘要 |
PURPOSE:To obtain a photoconductive member which has excellent durability and moisture resistance and in which residual potential is not observed in an amorphous silicon (a-Si) photoconductive member of laminated type, by providing the specific 2nd amorphous layer on the specific 1st amorphous layer. CONSTITUTION:A substrate 101 and the 1st amorphous layer 102 which consists of an armophous material consisting basically of Si atoms and contg. H atoms and/or halogen atoms and exhibits photoconductivity are provided. The layer 102 is composed of the 1st layer region 103 contg. atoms of O as constituting atoms and the 2nd layer region 104 contg. atoms of the group III as constituting atoms, both of which areas co-possess at least part thereof and exist internally near the substrate 101, and between which the relations of the equation is established if the thickness of the region 104 is defined as tB and the difference between the thickness of the layer 102 and the thickness tB of the 2nd layer region as T. The 2nd amorphous layer 107 contg. Si atoms, C atoms and halogen atoms is provided on the layer 102. |
