| 摘要 |
PURPOSE:To enable the formation of a coating film whose coating characteristics is high and whose denseness is excellent, by performing a heat treatment at a specified temperature in an atmosphere containing water vapor, after a coating liquid for forming a silica coating film is spread on a substrate. CONSTITUTION:In the case where coating liquid for forming a silica coating film is spread in a specified thickness and dried to stick a silica coating film on a substrate, the coating film is subjected to a heat treatment in an atmosphere containing water vapor. At this time, water vapor is contained in nitrogen gas or oxygen gas, or mixed gas of nitrogen and oxygen, or air. The more the water vapor is contained, the better result is obtained, and the water vapor pressure is at least of the value required to be higher than or equal to 0.2X10<-5>Pa. The temperature can be fixed at a specified value, or changed continuously or discontinuously, if only the heating temperature is in the range of 100-1000 deg.C. Thereby, a uniform silica coating film with high denseness can be formed.
|
