发明名称 DIFFUSION FURNACE DEVICE
摘要 <p>PURPOSE:To enable semiconductor substrate lots to be processed in the optimum positions in a furnace by a method wherein the optimum positions and the precedence order per semiconductor substrate lot are automatically judged by a controller to re-erect the lots on the positions suitable for them. CONSTITUTION:A resetting mechanism 4 is controlled by a controller 5 while this controller 5 is previously informed of respective identification numbers of semiconductor substrate lots to be processed from now on by a preceding controller 6 to determine the re-erecting positions by the optimum positions and precedence. Therefore, the semiconductor substrate lot 3 fed from preceding process to this position can be automatically reset at a position previously determined for setting. Finally, six lots assumed as one batch to be processed next time and reset in order on the specified position are loaded on a mother boat 1 to be inserted into a diffusion furnace for processing.</p>
申请公布号 JPS63274130(A) 申请公布日期 1988.11.11
申请号 JP19870111259 申请日期 1987.05.06
申请人 NEC KYUSHU LTD 发明人 SASAHARA KATSUYUKI
分类号 H01L21/677;H01L21/02;H01L21/205;H01L21/22;H01L21/68 主分类号 H01L21/677
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