| 摘要 |
PURPOSE:To monitor the rate of oil contamination caused by the back diffusion of oil used in an exhaust pump and wash an exhaust pipe and a reaction tube at a proper time and reduce defects in semiconductors caused by the oil contamination. CONSTITUTION:A reaction furnace in which a reaction tube 1 for producing a semiconductor by utilizing a depressurized condition and a heating means 2 are provided, a means 3 for supplying reactive gas to the reaction tube 1 and an exhaust pipe 8 and exhaust means 14 and 15 for depressurizing the inside of the reaction tube 1 are provided in a semiconductor manufacturing equipment. An oil contamination detecting means 20 equipped with a crystal oscillator 21 is attached to the reaction tube 1 or to the exhaust pipe 8. The oil contamination detecting means 20 is, for instance, composed of the crystal oscillator 21 attached to the inside of the reaction tube 1 or exhaust pipe 8 and a radio frequency oscillator and a frequency detector 30 connected to the crystal oscillator 21 through electrodes 22 and 23. A reticular member 32 for eliminating foreign particles is provided in the tube 1 or pipe 8 so as to cover the crystal oscillator 21 and the electrodes 22 and 23.
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