发明名称 DEVELOPING SOLUTION COMPOSITION OF PHOTOSENSITIVE MATERIAL
摘要 PURPOSE:To enable adequate development of a wash-off type photosensitive material having a water-insoluble image-forming layer by using said layer made of aqueous solution of a specified compound. CONSTITUTION:The developing solution is an aqueous solution containing one of the compounds represented by the formula in which R1 is 2-5C alkyl or alkoxy, and R2 is H, halogen, amino, or the like. It may contain said compound in a wide range up to its solubility, for example, in a concentration of 0.1-50wt.%, thus permitting the photosensitive material containing a material insoluble or hardly soluble in water or an aqueous alkaline solution to be adequately developed.
申请公布号 JPS63271256(A) 申请公布日期 1988.11.09
申请号 JP19870107319 申请日期 1987.04.28
申请人 KONICA CORP 发明人 NOGAMI AKIRA;KIYONO MINORU;UEHARA MASABUMI;NAKANO MIEJI
分类号 G03F7/30;G03F7/32 主分类号 G03F7/30
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