| 摘要 |
PURPOSE:To contrive improvement in pattern formation characteristics by a method wherein the end part of a microscopic aperture part is formed on a photosensitivity resin film using a different photomask and irradiating sensitizing light twice or more times. CONSTITUTION:Sensitizing light X is made to irradiate on resin films 2 and 4 through the first photomask 5, and the quantity of irradiation light is brought to the minimum with which a pattern can be formed on the photosensitive resin film 4 in the upper layer part of three-layer structure. Then, for the different pattern, the final pattern in other words, light Y with which a pattern can be formed is irradiated on the lower layer film 2 of the three-layer structure through the second photomask 7 having the pattern which does not have a photomask. Then, after the photosensitive resin film 4 of the upper layer part and the intermediate layer 3 have been removed, the photosensitive resin film 2 of the lower layer part is developed, and the pattern in which two kinds of photomasks 5 and 7 are composed, is formed. As a result, a microscopic pattern of the degree of resolution higher than that of the optical system of the irradiation light, can be formed.
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