| 摘要 |
PURPOSE:To uniformize the light intensity distribution on a substrate, to increase the light intensity, and to form a uniform film on the substrate by a photochemical reaction with high productivity by providing plural light sources in the photo-CVD device to cover the whole surface of the substrate, and furnishing a reflector on the rear of the light source. CONSTITUTION:The gaseous reactants such as a chloride, a hydride, and an org. compd. are sent onto the surface of the substrate 4 by the photo-CVD method, light is projected from lamps 1, and the material formed by the photochemical reaction and thermal decomposition is deposited on the surface of the substrate 4. In this case, at least three lamps 1 for photochemical reaction are used and arranged to cover the substrate 4 in the form of an almost semicylindrical side, and the light reflector 2 is fixed on the rear of the lamp. The light is uniformly projected on the substrate 4 due to the reflected light, the photochemical reaction is strongly and uniformly carried out, and a thin film having uniform thickness and quality is formed on the substrate 4 at a high rate by the photochemical reaction.
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