发明名称 MANUFACTURE OF VACUUM CHAMBER
摘要 PURPOSE:To maintain high vacuum in a chamber by removing hydrated oxide film of the inside surface of the chamber after making a case for a chamber from an Al plate chamber with tubular projecting parts, heating the chamber in oxygen-contg. gaseous atm. and thereby forming oxidized film on the inside surface of the chamber. CONSTITUTION:The box 3 for the chamber with inlet and exit parts is made from Al plate having at least one tubular projecting part 2. After removing the hydrated oxidized film on the inside surface of the box 3, the box is heated in oxygen-contg. gaseous atm. without contacting with the atm. contg. moisture to form oxidized film. As a result, adsorption and occlusion of the substances which decrease the vacuum on the inside surface of the box are remarkably decreased and besides, even when the substances are adsorbed and occluded, they can be easily removed by degassing. Due to that, the amt. of the released substances decreasing vacuum becomes smaller and the high vacuum in the chamber can be maintained when evacuated the chamber.
申请公布号 JPS63270536(A) 申请公布日期 1988.11.08
申请号 JP19870107337 申请日期 1987.04.30
申请人 SHOWA ALUM CORP 发明人 KATO YUTAKA;ISOYAMA EIZO;MANAKA SEIKICHI;INOUE TAKESHI
分类号 B01J3/00;B01J3/02 主分类号 B01J3/00
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