| 摘要 |
PURPOSE:To surely and rapidly remove impurity gases remaining in respective chambers and convey a substrate with good reproducibility, by evacuating the interior of a substrate exchange chamber and substrate preparation chamber while introducing hydrogen gas thereinto. CONSTITUTION:An opening and closing lid 1 of a substrate exchange chamber 3 is opened and substrates 10 are placed on substrate holders 11 on a carriage 12. A gate valve 21 is then opened and the interior of the chamber 3 is evacuated to a vacuum until the interior attains about 10<-8>Torr vacuum degree by a turbo molecular pump 22 and a rotary pump 23. A valve 24 is then opened to introduce H2 gas from a gas cylinder 26 through a mass flowmeter 25 until the interior of the chamber 3 attains 10<-3>-10<-4>Torr vacuum degree. A gate valve 28 is simultaneously opened to introduce H2 gas into a substrate preparation chamber 8 by a turbo molecular pump 29 and a rotary pump 30. A gate valve 27 is subsequently opened to introduce the carriage 12 in the chamber 3 into the chamber 8 and a current is passed through a heater 34 to remove steam sticking to the substrates 10. The introduction of the H2 gas is then temporarily stopped to evacuate the vacuum degree in the chamber 8 to about 10<-8>Torr. A gate valve 35 is subsequently opened to introduce the substrate 10 into a growth chamber.
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