发明名称 PRETREATMENT BEFORE ELECTROLESS PLATING
摘要 <p>PURPOSE:To form a high quality plated film free from pinholes when the surface of glass is subjected to electroless plating with a metal such as Ni, by successively spraying catalyst solns. for electroless plating on the glass surface and using the solns. under circulation. CONSTITUTION:When the surface of glass 1 is subjected to electroless plating with a metal such as Ni, the glass surface is cleaned by degreasing, roughened by etching with 20% NaOH soln. and well washed. An Sn catalyst soln. 2 made of an aq. soln. contg. 0.5g/l SnCl2 and 0.1ml/l HCl is then sprayed on the surface of the glass 1 from a spray nozzle 4 under 0.2-0.5kg/cm<2> pressure to for Sn catalyst nuclei 3 on the surface. After the surface is washed, a Pd catalyst soln. 5 made of an aq. soln. contg. 0.2g/l PdCl2 and 0.1ml/l HCl is further sprayed under 0.2-0.5kg/cm<2> pressure to form Pd catalyst nuclei 6. The catalyst solns. are used under circulation during the spraying so as to prevent the stagnation of the solns. and to form uniform catalyst nuclei layers. A plated film free from pits and pinholes is obtd. on the pretreated surface of the glass 1.</p>
申请公布号 JPS63270476(A) 申请公布日期 1988.11.08
申请号 JP19870103712 申请日期 1987.04.27
申请人 SEIKO INSTR & ELECTRONICS LTD 发明人 SUZUKI KIYOMI
分类号 C03C17/10;C23C18/18;C23C18/30 主分类号 C03C17/10
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