发明名称 MASK MANAGEMENT FACILITY
摘要 PURPOSE:To automate a lithograph mask management facility by providing such an arrangement that a central control device takes out a mask casing onto a traverse from a carrier in accordance with an input signal from a terminal device while recognizing a batch, and moves the traverse to a predetermined storage rack. CONSTITUTION:When a terminal device 6 requests the take-out of a mask casing 1, a central control device 7 moves a traverse 4 to a predetermined storage rack 2a to take out a predetermined mask casing 1. On the way of conveyance of the mask casing 1 to a carrier 3 by the traverse, a bar code reader 5 reads a bar code on the mask casing 1, and transmits thus read data to the central control device 7. The central control device moves the traverse to a predetermined carrier 3 and shifts the same onto the latter, and then the carrier 3 conveys the mask casing to a required position. On the contrary the above-mentioned steps are carried out in the reverse order when a mask casing is stored onto the storage rack 2a. With this arrangement, it is possible to automate the mask managing facility, to aim at enhancing the degree of cleanness and productivity.
申请公布号 JPS63267601(A) 申请公布日期 1988.11.04
申请号 JP19870101365 申请日期 1987.04.24
申请人 MITSUBISHI ELECTRIC CORP 发明人 ITOU SUKENORI;EJIRI IWAO
分类号 B65G1/137;G03F1/00;G03F1/66;G03F7/20;H01L21/027;H01L21/30;H01L21/673;H01L21/677 主分类号 B65G1/137
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