发明名称 |
INSULATING FILM FOR SEMICONDUCTOR, PRODUCTION OF THE SAME AND LIQUID COMPOSITION FOR PRODUCING THE SAME |
摘要 |
An insulating film for a semiconductor which comprises a cured product of a siloxane prepolymer produced by hydrolyzing and polycondensating (a) a tetraalkoxysilane of the formula: Si(OR<1>)4 (I) (b) an alkyl- or aryl-trialkoxysilane of the formula: R<2>Si(OR<3>)3 (II) (c) an dialkyl- or diaryl-dialkoxysilane of the formula: R<4>R<5>Si(OR<6>)2 (III) in a molar fraction of (a):(b):(c) of 0.14-0.50 : 0.03-0.66 : 0.11-0.66 wherein R<1> to R<6> are the same or different and are alkyl groups having 1 to 6 carbon atoms or aryl groups having 6 to 10 carbon atoms, which has good crack resistance, adhesivity with a substrate and surface evenness. |
申请公布号 |
EP0226208(A3) |
申请公布日期 |
1988.11.02 |
申请号 |
EP19860117503 |
申请日期 |
1986.12.16 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
NIWA, KENJI;SAWAGURI, YASUYOSHI;OH-YA, ASAO;KOIKE, HIRONOBU;SUZUKI, YUTAKA;INOUE, HARUO |
分类号 |
C08G77/00;C08G77/02;C08G77/04;C08G77/06;C09D183/00;C09D183/02;C09D183/04;H01L21/31;H01L21/312;H01L23/29;H01L23/31;(IPC1-7):H01L21/312;H01L23/28 |
主分类号 |
C08G77/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|