A multi-electron-beam pattern drawing apparatus.

摘要

A charged-particle beam pattern drawing apparatus for drawing, by use of a charged-particle beam, a desired circuit pattern on a workpiece (WF) having a surface coated with a sensitive material, is disclosed. The apparatus includes a data source CAD, PG, MU, ML) having stored therein a data related to the circuit pattern, a plurality of charged-particle beam producing sources (ES0-ES15) for emitting charged-particle beams toward the workpiece, in accordance with the data supplied thereto from the data source, and a plurality of deflecting electrodes (X1,X2,Y1, Y2) each being provided for corresponding one of the charged-particle beam producing sources, for deflecting the charged-particle beams from the charged-particle beam producing sources independently of each other and in accordance with the data supplied from the data source.