| 摘要 |
PURPOSE:To uniformly dry a semiconductor wafer in a highly clean state by providing a vapor guide for introducing part of generated steam up to the top of an article to be treated, and supplying the steam from above the article to be treated. CONSTITUTION:Alcohol stored in a treating tank 1 is heated by a heater 7 and vaporized. In this case, the alcohol vapor generated inside a vapor guide plate 13 is supplied from below to a semiconductor wafer 3. On the other hand, the alcohol vapor generated outside the plate 13 is injected through between the plate 13 and the peripheral wall from an opening disposed above the wafer 3, and supplied from above to the wafer 3. In this case, it can prevent the vapor from becoming mist on the way by heating by another heater 12. Alcohol condensed by a condenser 8 and alcohol suitably supplied from a supply tube 6 are fed down along the inner periphery of the tank 1 by a deflector, heated on the way by the heater 12 to be vaporized, guided to the plate 13, and supplied from above the wafer 3. |
