A multi-electron-beam pattern drawing apparatus.

摘要

A multi-electron-beam pattern drawing apparatus having a plurality of electron beam sources (ES0-ES15) and a plurality of electron beam sensors (e.g. S1-S9), provided on a common base member (MB), is disclosed. The electron beam sources can be selectively driven for different uses, such as a pattern drawing (exposure) purpose and position detecting purpose, for example. In another aspect the apparatus is provided with a function for correcting the pattern drawing magnification.