发明名称 TWO-STAGE TYPE AUTOMATIC DEVELOPING MACHINE
摘要 PURPOSE:To simplify a trouble for processing and developing an exposed original plate and to reduce a floor area of a device to half by constituting a develop-processing part and its subordinate processing part of a two-stage structure, and executing simultaneously the processing by the lower stage processing part and the upper stage processing part. CONSTITUTION:A develop-processing part A, its subordinate rinse-processing part B, a wash- processing part C, a gum apply-processing part D and a dry-processing part E are divided into lower stage processing parts A1, B1, C1, D1 and E1, and upper stage processing parts A2, B2, C2, D2 and E2, respectively. Each processing is executed in each processing part in a state that the upper stage processing parts are superposed on the lower stage processing parts, the upper stage processing parts move to both the left and right together with an upper stage slide frame 3, and when they move in the right direction, the upper face extending from the left end part of the lower stage processing parts to near a stopper 10 is opened, and when they move in the left direction, the upper face of the right end part is opened, and in both cases, a work such as cleaning, an inspection, a repair, etc. can be executed easily by inserting a hand or tools into the lower stage processing parts from the opening part. After the work is ended, they are returned to the normal position and are coupled by hooking a latch 14 to a projection 13. According to this constitution, a trouble, time, expense, etc. for replacing a developer, etc. and cleaning are curtailed, and the floor space is reduced to half.
申请公布号 JPS5991446(A) 申请公布日期 1984.05.26
申请号 JP19820201735 申请日期 1982.11.17
申请人 ROKUOU SHOJI KK 发明人 TANIGUCHI HISAO
分类号 G03F7/30 主分类号 G03F7/30
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