发明名称 ALLOY TARGET AND PRODUCTION THEREOF
摘要 PURPOSE:To obtain a film having a uniform distribution of compsn. by press- molding powder of plural kinds of metals and/or alloys so as to provide a prescribed distribution of compsn. and by using the resulting alloy target for sputtering having a prescribed plane distribution of compsn. CONSTITUTION:When powder of plural kinds of metals and/or alloys is press- molded in a mold to obtain an alloy target for forming a film having a prescribed compsn. such as Th25Fe75, the press molding is carried out so as to provide a distribution of compsn. in which the central part is Th25Fe75 and the Fe content increases gradually toward the periphery. Thus, an alloy target having a prescribed plane distribution of compsn. is obtd. By using the alloy target, a film having a uniform distribution of compsn. is obtd.
申请公布号 JPS63266066(A) 申请公布日期 1988.11.02
申请号 JP19870100012 申请日期 1987.04.24
申请人 TEIJIN LTD 发明人 SUGIYAMA MASATO
分类号 C23C14/34 主分类号 C23C14/34
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