| 摘要 |
<p>An electron beam head particularly suitably usable in an electron beam pattern drawing apparatus or otherwise is disclosed. The electron beam head includes an electron beam source (BG) and an electron beam detector (PN) which are provided on a common base member. Secondary electrons (2e) and/or reflected electrons caused when an electron beam (EB) emitted from the electron beam source impinges upon a workpiece or an object to be examined, are detected by the detector. These secondary electrons and/or reflected electrons can be efficiently collected and detected and, on the basis of which, the information concerning the position or otherwise related to the workpiece or the object to be examined can be detected precisely.</p> |
