发明名称 Method and apparatus for resistance adjustment of thick film thermal print heads
摘要 A method and an apparatus for adjusting the resistance value of a thermal head assembly. One voltage pulse or a set of voltage pulses of a preselected peak value are impressed on the heat generating resistor elements of the thermal head assembly. The resistance values of the resistor elements are then measured and compared with the predetermined target value. If the measured resistance values are above the target value, the resistor elements are subjected to another pulse or set of pulses having a peak value a little higher than the preceding one. Then, the resistance values are again measured and compared with the target value. Thus, the resistance values are decreased by successively impressing voltage pulses with the peak value thereof being increased little by little, until the resistance values become lower than the target value.
申请公布号 US4782202(A) 申请公布日期 1988.11.01
申请号 US19860946968 申请日期 1986.12.29
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 SAWAE, TETSUNORI;YAMASHITA, HIROMI;ENDO, TAKAFUMI;KATAYAMA, KOHEI;MURATA, YUKIO
分类号 B41J2/355;H01C17/26;H01L49/02;(IPC1-7):H01L49/00;B41J3/20 主分类号 B41J2/355
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