发明名称 PRODUCTION OF ABRASIVE MATERIAL
摘要 PURPOSE:To obtain an abrasive material enabling fine working and having a long service life by introducing a reactive gas into a vacuum vessel and allowing the gas to react with starting material for carbon under microwaves in a magnetic field to form a carbon film contg. diamond particles on a substrate. CONSTITUTION:A vacuum vessel 11 is evacuated. A gaseous mixture of Ar with hydrogen or the like is introduced into the vessel 11 from the reactive gas inlet 12 and a carbon-contg. gas such as methane as starting material is introduced from the starting material inlet 13. A magnetic field is then applied to the vessel 11 and microwaves are introduced from a waveguide 14. Plasma discharge is caused by electron cyclotron resonance and a carbon film 22 contg. diamond particles 21 is deposited on the uneven surface of a substrate 15 having recesses of <=5,000Angstrom depth to obtain an abrasive material. The bonding strength of the diamond particles 21 to the substrate 15 is increased and the polishing performance is improved. The abrasive material is used to polish a lens or the like.
申请公布号 JPS63262468(A) 申请公布日期 1988.10.28
申请号 JP19870097833 申请日期 1987.04.21
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HIROCHI KUMIKO;FUKUDA TOMIYO;KITAHATA MAKOTO;YAMAZAKI OSAMU
分类号 C09K3/14;C23C16/26;C23C16/27;C23C16/50;C23C16/511;C30B29/04 主分类号 C09K3/14
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