发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain the titled composition which is capable of alkali-developing and has good forming property and is suitable to prepare a photosensitive planographic plate by incorporating a compd. having pivaloyl group in the titled composition contg. a photosensitive diazo resin and a binder. CONSTITUTION:The compd. having the pivaloyl group is incorporated in the titled composition contg. the photosensitive diazo resin and the binding agent. The compd. usable to the compd. having the pivaloyl group, comprises the compd. modified a compd. having a group (hydroxyl, amino or thiol group, etc.) capable of reacting with a pivalic acid derivative such as pivalic acid or pivalic acid chloride with the pivalic acid derivative, or a polymer contg. a monomer unit having the pivaloyl group, and is exemplified by P-hydroxy styrene, etc. Thus, the forming property of the titled composition is effectively improved by adding the compd. having the pivaloyl group to the titled composition.
申请公布号 JPS63262642(A) 申请公布日期 1988.10.28
申请号 JP19870098359 申请日期 1987.04.21
申请人 FUJI PHOTO FILM CO LTD 发明人 MISU HIROSHI;AONO KOICHIRO;AOTANI NORIMASA
分类号 G03C1/00;G03F7/004;G03F7/016;G03F7/021 主分类号 G03C1/00
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