发明名称 PRODUCTION OF THIN OXIDE FILM
摘要 PURPOSE:To produce a thin oxide film having a uniform compsn. and a uniform arbitrary thickness by forming a film of an org. substance having adsorbed metal ions on the surface of water in a water tank, transferring the film to the surface of a fixed substrate and heat treating it in the presence of oxygen. CONSTITUTION:A film of one or more kinds of org. substances having adsorbed metal ions or gel of them or forming ion pairs with the metal ions is formed on the surface of water in one or more water tanks. The metal ions are ions of at least M1, M2 and M3 (M1 is one or more among B, Al, Ga, In, Tl, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu, M2 is one or more among Be, Mg, Ca, Sr, Ba, Ra, Sn and Pb, and M3 is Cu). The film if transferred to the surface of a fixed substrate by a horizontal or perpendicular sticking method. The film on the substrate is then heat treated in the presence of oxygen to obtain a thin metal oxide film for a superconductor or the like.
申请公布号 JPS63262478(A) 申请公布日期 1988.10.28
申请号 JP19870094696 申请日期 1987.04.17
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 FUJIKI MICHIYA;SUKEGAWA TAKESHI
分类号 C23C18/12;C23C26/00;C23C30/00;H01B12/06;H01B13/00;H01L39/12;H01L39/24 主分类号 C23C18/12
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