发明名称 SEMICONDUCTOR SUBSTRATE AUTOMATIC CHEMICAL TREATMENT APPARATUS
摘要 PURPOSE:To prevent chemicals from undergoing waste and deterioration by causing a carrier and a substrate which are withdrawn from a treatment vessel in the preceding stage to stop driving only for a time which is necessary for removing drippings of chemicals attached to the above component parts and by carrying the component parts to the treatment vessel in the latter stage after the above time elapsed. CONSTITUTION:After a carrier 3 and a wafer 5 are taken out of a treatment vessel 2 by having the above component parts caught by an arm 1a of a carrying equipment 1, this apparatus allows the carrying equipment 1 to stop driving for a fixed time on its vessel 2 so as to remove drippings of chemicals attached to the component parts 3 and 5 and after the above time elapsed, the component parts 3 and 5 are carried by the equipment 1 to another treatment vessel 4 in the latter stage and then the treatment of the wafer 5 in the vessel 4 is performed once more. In this way, attachment of the chemicals to the carrier and the wafer is so limited at a minimum that this approach may avoid some of demerits: waste of the chemicals because of carrying away from the vessel during treatment, development of poor conditions due to fluctuations in the chemicals temperature, and deterioration of treatment liquid due to bringing of the chemicals into another vessel in the latter stage.
申请公布号 JPS63260037(A) 申请公布日期 1988.10.27
申请号 JP19870093951 申请日期 1987.04.16
申请人 NEC KYUSHU LTD 发明人 NONAKA HIROSHI
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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