LINEAR ELECTRON BEAM DEVICE

摘要

PURPOSE:To improve the yield of electron beams by providing a mask, only the opening part of which is permeable for electron beams while the rest interrupts permeation of the electron beams. CONSTITUTION:Linear electron beams 4 outcoming from an electron gun produce their image on a sample 9 by the aid of a lens 5. The linear electron beams 4 scan the sample 9 by the aid of a deflector 6 but interrupted by a mask 8 so that only the mask opening part 7 is permeable for the linear electron beams for being given thermal treatment. A sample holder 10 is set on an XY table 12 to move the sample 9 by a driving system 11 so as to bring the region of the sample desired to be given thermal treatment by electron irradiation, in the range of irradiation of the electron beams 4 passing through the mask opening part 7.