| 摘要 |
PURPOSE:To obtain a high frequency power operated treatment device where stable high frequency power having a high responsiveness is supplied by measuring actual high frequency power which is used for the treatment and by performing feedback control, thereby driving a high frequency power generating circuit on the basis of the above measurement. CONSTITUTION:Output signals of an analog converter 16 are inputted in a comparator 13 and are compared with the output signals generated by a power operator 12. The comparator 13 outputs the signals corresponding to a deviation based on the above comparison and its generated power is adjusted by operating a high frequency power generating circuit 8 so that its deviation may become zero. On the other hand, the operator 12 multiplies measured values of high frequency current and voltage measuring circuits 10 and 11 which are provided between a matching circuit 5 and a treatment chamber 1 and a power that is actually used for a plasma etching treatment is calculated. The calculated values are inputted in the comparator 13 on one hand as above mentioned and the values are compared with those measured by a power measuring apparatus 17 and on the other hand are shown in terms of digital display by an indicator 15 through A/D converter 14.
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