| 摘要 |
PURPOSE:To form predetermined patterns for respective sections in order from a reference position and reduce the quantity of data required for generating patterns substantially by a method wherein an exposure starting position is determined from the reference position information of the pattern and an aperture to be exposed is determined from the data showing the form of a unit pattern and whether the exposure is necessary or not is determined from bit information. CONSTITUTION:A memory 20 is preset at a reading mode by a memory access circuit. Reference coordinates data (Xs, Ys) which determine the reference position (starting position of a block) of X and Y and pitch information (Xp, Yp) are supplied to a position control circuit 23. W and H data which determine the size (exposed aperture form) of shot are supplied to a shot control circuit 22. Bit information is supplied to a blanking control circuit 21. Pieces of position information of the respective sections are successively prepared from the bit information which shows the intervals between the respective sections and the respective starting addresses of X and Y which show the reference position of the surface on which patterns are formed and whether the exposure is necessary or not is controlled in accordance with the bit informations corresponding to the respective positions (respective sections) at the respective positions where the pieces of position information are prepared. |
