| 摘要 |
PURPOSE:To improve the sensitivity, the resolution and the oxygen plasma durability of the titled composition by using a specified polyorganosilsesquioxane type polymer and a photosensitive solution inhibitor for the titled composition. CONSTITUTION:The composition contains the alkali-soluble polyorganosilses quioxane type polymer (A) which is an org. group contg. a phenolic hydroxy group in one or more of side chains and the photosensitive solution inhibitor (B) as a main component. And, the polymer A is preferably the polymer shown by formula (I) [wherein R1-R6 are each preferably a group shown by formulas II-VII. (l)-(q) are each a positive integer]. And, the inhibitor B is preferably o-quinone diazide shown by formula VIII (wherein R7 is a monovalent org. group). Thus, the titled composition which is suitable for an alkali developing method and is applicable to the upper layer resist in two layers resist method is obtd. |
