| 摘要 |
PURPOSE:To extend the service life of an electrode by forming a metallic thin film of tungsten, etc., having a high melting point and high hardness to a specific thickness on a contact part between a copper alloy electrode and members to be welded by a CVD method (chemical vapor deposition method). CONSTITUTION:The metallic thin film 5 of tungsten, etc., having a high melting point and high hardness characteristic is formed on the tip part 4 of the electrode 3 made of a copper alloy such as Cr-Cu alloy, etc., by the CVD method (chemical vapor deposition method). On this occasion, the thickness of the thin film 5 is regulated in the range of 20-40mum. Since the metallic thin film 5 is constituted of the fine thin film formed by the CVD method, a lowering of the thermal conductivity is restrained to the minimum. Further, since the thin film 5 has the high melting point and high hardness characteristic, its shape is hardly changed. By this method, the service life of the electrode 3 is remarkably extended. |
