| 摘要 |
PURPOSE:To obtain the title polymer containing a combination of Si atoms and allyl groups in its structural units, being capable of forming fine patterns with high sensitivity to electron beams, X-rays, deep ultraviolet rays and ion beams and high resistance to dry etching. CONSTITUTION:The subject polymer contains both of silicon atoms and allyl groups in its structural units. Said polymer is, for example, a styrene polymer having a unit of formula I (X is a positive integer). The polymer having the units of formula I is obtained, for example, by reaction of 4-chloro-alpha- methylstyrene with chloromethyldimethylchlorosilane, reaction of the product with allyldimethylchlorosilane and anionic polymerization of the product of formula II in the presence of n-Butyl Li in THF at -78 deg.C. |
