| 摘要 |
PURPOSE:To form a stable hard BN film having superior adhesion on the surface of a heated base body by ionizing high purity B evaporated by heating in a reactor evacuated to high vacuum and by introducing high purity gaseous N2 into the reactor. CONSTITUTION:A reactor is evacuated to such a high degree of vacuum as >=1X10<-7>Torr and the amt. of O2 in the atmosphere is reduced to <=about 1wt.%. High purity B having >=99.9% purity is evaporated by heating with electron beams or the like in the reactor. The resulting B vapor is ionized and accelerated by applying a high frequency electric field or the like. At the same time, high purity gaseous N2 having >=99.999% purity is introduced into the reactor and a base body of W, bronze, Si3N4 ceramics or the like set in the reactor is heated to about 500-1,000 deg.C. Thus, a high density BN-based stable film having superior adhesion to the base body is formed on the surface of the base body to obtain a hard BN film.
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