发明名称 Process for the continuous, contact-free measurement of layer thicknesses and apparatus for performing the process
摘要 Disclosed is a process and apparatus for measuring, in a continuous and contact-free manner, the thickness of a layer applied to a support. The apparatus includes a measuring apparatus which comprises a corona and a first electrostatic voltmeter positioned downstream of the corona in the direction of travel of the layer being measured. The process includes the steps of passing the layer under the apparatus, charging the layer in a contact-free manner, and measuring the level of the charging voltage.
申请公布号 US4780680(A) 申请公布日期 1988.10.25
申请号 US19850793781 申请日期 1985.11.01
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 REUTER, KLAUS;LINGNAU, JUERGEN
分类号 G01B7/06;(IPC1-7):G01N27/60 主分类号 G01B7/06
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