| 发明名称 |
Non-uniform gas inlet for dry etching apparatus |
| 摘要 |
A gas inlet having a non-uniform array of inlet holes for the non-uniform introduction of an etching gas into a reaction chamber of a dry etching apparatus. The non-uniform introduction of gas compensates for non-uniform characteristics in the dry etching apparatus resulting in a uniform etch.
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| 申请公布号 |
US4780169(A) |
申请公布日期 |
1988.10.25 |
| 申请号 |
US19870048344 |
申请日期 |
1987.05.11 |
| 申请人 |
TEGAL CORPORATION |
发明人 |
STARK, MARK M.;WARENBACK, DOUGLAS H.;DRAGE, DAVID J. |
| 分类号 |
H01J37/32;H01L21/301;(IPC1-7):C23F1/02 |
主分类号 |
H01J37/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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