| 摘要 |
PURPOSE:To obtain a photosensitive compsn. which can form a coating film which is uniform, flat and of good quality and enables a good pattern to be formed, by blending a specific polyamic acid with a specific compd. and a perfluoroalkylpolyoxyethylene ethanol. CONSTITUTION:A photosensitive polyimide compsn. consists of a polyamic acid (A) of the formula (wherein R1 is a trivalent or tetravalent org. group; R2 is a bivalent org. group; m is 1 or 2), a compd. (B) having a photosensitive group and an aliph. tert. amino group and a perfluoroalkylpolyoxyethylene ethanol (C). In the formula, R1 has pref. such a structure that the carbonyl groups in the main chain are directly attached to the arom. ring or arom. heterocyclic ring from the view point of heat resistance of the polyimide polymer. Pref. R2 has such a structure that the amide group in the main chain is directly attached to the arom. ring or arom. heterocyclic ring from the viewpoint of heat resistance of the polyimide polymer. |
