发明名称 PATTERN FORMATION
摘要 PURPOSE:To prevent a fault caused by the peeling defect of a mask from occurring by cutting some of corners of a rectangular, square, or triangular original image mask. CONSTITUTION:The rectangular original image pattern is formed like a pattern 2 whose parts 1 and 3-5 are cut. The square original image pattern is formed like a pattern 7 whose parts 6 and 8-10 are cut. Then, the triangular original image pattern is formed like a pattern 12 whose parts 11 and 13-16 are cut. In this case, two parts are cut at the left and right lower corners to remove acute parts. Consequently, the original image pattern becomes hard to peel and a pattern which has a little fault occurrence due to a mask defect is formed.
申请公布号 JPS63256958(A) 申请公布日期 1988.10.24
申请号 JP19870090761 申请日期 1987.04.15
申请人 HITACHI LTD 发明人 ITO TETSUO
分类号 G03F1/00;G03F1/68;G03F1/70;H01L21/027;H01L21/30 主分类号 G03F1/00
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