| 摘要 |
PURPOSE:To shorten the cleaning time at the time of plasma cleaning by providing a cover for isolating whole or part of an inner wall in a vacuum chamber from a plasma atmosphere, and burying a heating element in the cover. CONSTITUTION:Covers 16, 17 are attached by utilizing the flange of a sidewall 3. The cover 16 is composed of a quartz or ceramic cover base material 161, an electric resistor 162 which serves as a heating element, electrodes 163, 164 and an insulating film 165, the electrodes 163, 164 are disposed through an electrically insulating gap 166, extended to the upper surface of the flange of the cover 16, the filmlike electric resistor 162 is formed on the outer surface of the material 161 by means, such as depositing or seizing of coating agent reversely to the gap 166 between the electrodes 163 and 164, and the resistor 162 and the outer surfaces of the electrodes 163, 164 are coated with an insulating film except of the electrodes on the flange. Thus, since the cover can be directly heated, a deposit adhered during the plasma processing can be reduced to shorten its cleaning time.
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